SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development - Agreement builds on more than a decade of collaboration between the two companies

Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

To address this issue, as a leader in semiconductor production equipment, the SCREEN Group has developed an innovative technology for reducing organic wastewater with the potential to …

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SCREEN has dedicated itself to developing advanced technology that is a step ahead, so that we can consistently offer optimal solutions that streamline processing while improving productivity and quality.

*APAC: Advanced Process Atmosphere Control. Screen’s ultra-clean chamber technology.

1. These systems enable half-pitch transfer of wafers. The size of baths has been reduced to minimize the volume of chemicals and DI water used. 2. The CHB chemical circulation bath allows processing …

As its fourth successful Frontier project development, Screen is proud to present the SU-2000, a Single Wafer Cleaner ideally suited to green device production.

The Truepress JET S320 delivers exceptional color reproduction with its ability to print directly onto offset coated papers. At the same time, its superior productivity enables it to keep pace with rapidly …

4. Emissions reduction solution (optional) An optional exhaust recirculation system reduces total emissions by 65%, ensuring clean equipment operation to support ESG measures. 1. Based on …